Ta2O5 films were prepared with conventional electron beam evaporation and annealed in O2 at 673 K for 12 h. Laser-induce......

采用了一种较为新颖的真空热处理和大气气氛下热处理相结合的热处理工艺,并应用到两种以反应溅射工艺为基础制备出的多层Ta2O5膜样......