Experimental and numerical investigations of Ar inductively coupled plasma for a remote plasma

来源 :13th Asia-Pacific Conference on Plasma Science and Technolog | 被引量 : 0次 | 上传用户:rockykimi81
下载到本地 , 更方便阅读
声明 : 本文档内容版权归属内容提供方 , 如果您对本文有版权争议 , 可与客服联系进行内容授权或下架
论文部分内容阅读
  An inductively coupled plasma (ICP) system in which a remote ICP (expansion region) with large volume is attached to a main ICP (driver region) is developed.The axially and radially resolved measurements of the electron density,electron temperature and electron energy probability function (EEPF) for Ar discharge are systematically conducted by making use of Langmuir probe with respect to applied power and gas pressure.At the same time,the variation of electron density and electron temperature with external parameters is given by a fluid model,and a comparison between experimental and simulation results is illustrated also.
其他文献
High enthalpy plasma wind tunnels which could offer high heat flux over minutes are not replaceable in evaluating thermal protection system (TTPS) performances in atmospheric reentries of hypersonic v
A comparative investigation of two models of atmospheric-pressure free-burning argon arc plasma are carried out in the rang of current from 20 to 200A.The two models both account for the effects of th
The effect on the mode transition power in spiral coil discharge was studied with different size antennas,such as number of antenna coils,interval of antenna coils.In our experiment,the results presen
In this work,we report the parameters in novel plasma source diagnosed by optical emission spectrometry (OES) during a high c-axis orientation ZnO film deposition.The high power impulse magnetron sput
Atomic layer etching (ALE) is gaining prospects in industry application,as the precision demands for smaller feature patterning is more urgent.The ALE process uses cyclic passivation and etching steps
We report a simulation study on single nanosecond pulse high voltage discharge in dry-air at a pressure of 100 Torr.Apart from the usual processes such as vibrational-vibrational exchange and vibratio
As widely used in the substrate etching,thin film growth,plasma propulsion,materials processing and semiconductor industry,inductively coupled plasma source (ICPs) excited by a single radio frequency
Plasma large-area etching technology requires inductively coupled plasma (ICP) reactors to work with a uniform plasma density.A two-dimensional (2D) self-consistent fluid model has been employed to in
会议
Probe-assisted pulsed laser induced photo-detachment (LIPD) technique was usually used for diagnose negative ion denstiy,electronegativity and even negative ion temperature in the electronegative plas