Microchannel plates(MCPs)are the key component of the image intensifier.Compared with the traditional MCPs,the Si MCPs which are fabricated by micro-nanofabrication technologies have a high gain,low noise and high resolution etc.In this paper,the lithography process is studied in the process of fabricating periodic micropore array with 10 pores and 5 pitch on Si.The effects of exposure time,reversal bake temperature and development time on the lithography quality are focused.By doing a series of experiments the better result is got: the photoresist film is obtained at a low speed 500/15(rpm/s)and a high speed 4500/50(rpm/s); the soft bake time is 10min at 100℃; the exposure time is 10s; the reversal bake time is 80s at 115℃; the development time is 55s.By microscope observation and measurement,the pattern is complete and the size of the pattern is accure,it meets the requirement of lithography process for fabricating Si-MCP.