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本文报导了磁控溅射靶设计的一种新思路，这种长条矩形靶是垂直安装并双面溅射的靶，溅射轨道按“背环”方式来布局的一种新靶型，称为背环靶。背环靶最主要的优点是：与同样靶长的其他靶型相比，溅射有效均匀区最长，因而膜层均匀性和重复性较好。这种靶型，或在该靶型结构思路上变换出来的新靶，在其他机型中应用，也有若干明显的优点。
In this paper, a new idea of magnetron sputtering target design is reported. The long rectangular target is a new type of target with vertical mounting and double-sided sputtering. The sputtering target is laid out in “dorsal loop” Known as the dorsal ring target. The main advantage of the dorsal ring target is that the effective area of sputtering is the longest compared to other target types of the same target length, so that the uniformity and repeatability of the film are better. This target type, or the new target transformed from the target type structure idea, is used in other models and has several obvious advantages.