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在室温条件下,用高能Ar离子轰击镀有银膜的Si片(Ar离子的能量为67KeV,注入剂量为5×10~(15)cm~(-2)),形成了无定形Ag-Si合金薄膜。用x射线衍射、反射式高能电子衍射(RHEED)、二次离子质谱(SMIS)、以及阳极氧化剥层——椭圆偏振技术,研究了这种无定形合金膜的形成及其退火性能。结果表明:这种无定形合金,直到600℃还是稳定的;但它的无序结构发生了微小的弛豫,其短程有序畴的大小由9.63()变为11.69()。对这种无定形合金的形成,进行了较为详细的讨论。还讨论了阳极氧化剥层——椭圆偏振技术在离子束混合层的研究中的用途,认为这是一种简便而有用的研究手段。
At room temperature, the Si film coated with silver film (energy of Ar ions is 67 KeV and implantation dose is 5 × 10 ~ (15) cm -2) is bombarded with high energy Ar ions to form amorphous Ag-Si Alloy film. The formation and annealing behavior of this amorphous alloy film were investigated by x-ray diffraction, RHEED, secondary ion mass spectrometry (SMIS), and anodized delamination-ellipsometry. The results show that the amorphous alloy is stable up to 600 ℃. However, its amorphous structure undergoes a slight relaxation and the size of its short range ordered domains changes from 9.63 () to 11.69 (). The formation of this amorphous alloy was discussed in more detail. It also discusses the use of anodizing delamination-ellipsometry in the study of ion beam mixing layers, which is considered as a convenient and useful method of research.