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用氮离子束分别原位溅射 Ｔｉ和石墨靶的方法制备了 ＣＮｘ／ＴｉＮｙ多层膜用 Ｘ射线光电子谱分析 ＣＮｘ层中 Ｃ和Ｎ的键合状态，用透射电镜观察薄膜中的相形貌，用电子衍射和 Ｘ射线衍射的方法分析相的结构．结果表明， ＣＮｘ层中主要有 Ｎ—ｓｐ２Ｃ和 Ｎ—ｓｐ３Ｃ两种键合状态，薄膜中观察到的 Ｃ－Ｎ化合物尺寸为 １０－６０ｎｍ的晶体颗粒，其衍射数据可用立方Ｃ３Ｎ４结构标定．证实了该薄膜中存在立方 Ｃ３Ｎ４化合物
CNx / TiNy multilayers were prepared by in-situ sputtering of Ti and graphite target with nitrogen ion beam respectively. The bonding state of C and N in CNx layer was analyzed by X-ray photoelectron spectroscopy. The phase morphology was observed by transmission electron microscope , The structure of the phase was analyzed by electron diffraction and X-ray diffraction. The results show that there are mainly two kinds of bonding states of N-sp2C and N-sp3C in the CNx layer. The crystal particles with C-N compound size of 10-60nm are observed in the film. The diffraction data can be calibrated with cubic C3N4 structure. It was confirmed that cubic C3N4 compounds were present in the film