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本文叙述了用反应性溅射制备硫化锌薄膜的方法。在氩气和硫化氢混合气氛中,当直流辉光放电时,氩气溅射到纯锌阴极上,而在置于阳极上的玻璃载片或导电玻璃衬底上形成硫化锌薄膜。 为寻找最佳溅射条件,在不同条件下制作了薄膜,所得结果如下: 延长溅射时间和降低衬底温度均能增加薄膜厚度,当混合气体中的氩气体积约占 70％和混合体的压力约 1.5 ×10~(-1)μ时,薄膜为最厚。 在溅射形成的薄膜的x线辛射图象中,只能看至β-ZnS(111)峰。在溅射过程中,衬底温度越高,β—ZnS(111)的反射也越强。在真空中进一步烧结,可改进薄膜的结晶性能。
This article describes a method for reactive sputtering to prepare zinc sulfide thin films. In a mixed atmosphere of argon and hydrogen sulfide, when DC glow discharge, argon is sputtered onto a pure zinc cathode while a zinc sulfide thin film is formed on a glass slide or a conductive glass substrate placed on the anode. In order to find the optimal sputtering conditions, the films were fabricated under different conditions. The results are as follows: Prolonging the sputtering time and decreasing the substrate temperature can increase the film thickness. When the volume of argon gas in the mixed gas is about 70% The pressure is about 1.5 × 10 ~ (-1) μ, the film is the thickest. Only the β-ZnS (111) peak was observed in the x-ray emission image of the sputtered film. During sputtering, the higher the substrate temperature, the stronger the reflection of β-ZnS (111). Further sintering in vacuum can improve the crystalline properties of the film.