用扫描探针显微镜(SPM)观察了能量76keV、剂量1.7×10cm-2的N团簇离子注入Si(111)单晶表面的形貌。发现在此条件下,注入层已直接转化成具有一定粒度分布的纳米晶结构,并测量了形成晶粒的尺度及分布。用红外吸收实验检测了该实样的光学特性。实验表明,该试样对频带很宽的红外光产生了很强的均匀吸收,在红外光区,其透光度均保持在10%左右,表明其注入层已形成一种品质优良的吸光材料。 The morphologies of Si (111) single crystal implanted with N clusters at an energy of 76keV and a dose of 1.7 × 10cm-2 were observed by a scanning probe microscope (SPM). It was found that under this condition, the injection layer has been directly transformed into a nanocrystalline structure with a certain particle size distribution, and the size and distribution of the formed grains were measured. The real optical properties were measured by infrared absorption experiments. Experiments show that the sample has a very uniform absorption of a wide band of infrared light. In the infrared region, its transmittance is maintained at about 10%, indicating that the injection layer has formed a good quality light absorbing material .