The identification of the switching location has been a key technology to tune the physical properties of unipolar resistive switching (RS) cells. Here we report the RS properties of Au/NiO/SrTiO3(STO)/Pt memory cells. The switching repeatability is closely related to the applied bias polarity, which is different from the scenario of the Au/STO/Pt cells reported in our previous researches. The high resistance in positive bias is greater than that in negative bias. The R(T )–R0I2R(T ) plot of the on-state I–V curve shows a regular shape only with a slight bend and an abnormal shape with an abrupt increase and decrease under negative and positive bias, respectively. These comparative experimental results reveal that the conductance filament consisting of oxygen vacancies grows from the cathode to the anode. The spatial RS location is identified with the weaker part along the conductance filament length direction, which should be near the NiO/STO interface and STO/Pt interface under positive and negative bias, respectively.