Ta_2O_5薄膜以其很高的化学稳定性和优良的光学性能(如折射率高,光吸收率很低等)用于薄膜电容器、光波导和太阳能电池的减反射涂层等方面。以往的Ta_2O_5薄膜都是通过电子束蒸发钽然后热氧化或高频溅射、直流二极反应溅射获得的,并且上述用途的Ta_2O_5薄膜都是非晶膜。本文报道了在熔融石英基片上用直流二极反应溅射技 Ta_2O_5 thin films are used in thin film capacitors, antireflection coatings for optical waveguides and solar cells due to their high chemical stability and excellent optical properties such as high refractive index and low light absorption. The conventional Ta 2 O 5 thin films are all obtained by electron beam evaporation of tantalum followed by thermal oxidation or high-frequency sputtering and direct current two-electrode reactive sputtering, and the above Ta 2 O 5 thin films are all amorphous films. This paper reports the DC sputtering technique on a fused silica substrate