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Investigation of Electron Cyclotron Resonance Plasma-assisted Atomic Layer Deposition Al2O3 Thin Fil
[会议论文] 作者：Lijun Sang,Qiang Chen,Xingcun Li,Lizhen Yang,
来源：The 8th Asian-European International Conference on Plasma Su 年份：2011
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Axial uniformity of diamond-like carbon film deposited by multi-cavity coupling microwave surface-wa
[会议论文] 作者：Manman Zhao,Lijun Sang,Haibao Zhang,Qiang Chen,
来源：13th Asia-Pacific Conference on Plasma Science and Technolog 年份：2016
Recently,diamond-like carbon(DLC) films have been widely used in food packaging for attractive gas barrier properties[1].In this paper,DLC films were deposited by a novel home-made microwave surface-w...
Investigation of Electron Cyclotron Resonance Plasma-assisted Atomic Layer Deposition Al2O3 Thin Fil
[会议论文] 作者：Lijun Sang,Qiang Chen,Xingcun Li,Lizhen Yang,
来源：The 8th Asian-European International Conference on Plasma Su 年份：2011
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[会议论文] 作者：Zheng Guo,Zhongwei Liu,Lijun Sang,Qiang Chen,
来源：The 6th International Symposium on Plasma Nanosciences-Progr 年份：2015
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[期刊论文] 作者：Haiying WEI,Hongge GUO,Lijun SANG,Xingcun LI,Qiang CHEN,
来源：黑龙江科技信息 年份：2018
本文通过对荣华二采区10...
[会议论文] 作者：Zhongwei Liu,Zheng Guo,Qiang Chen,Qun Guo,Lijun Sang,
来源：第8届中日先进等离子体科学技术会议( 8th International Workshop on Plasma Scie 年份：2016
Copper interconnect has been the most promising technology for deep submicrometer ultralarge scale integrated (ULSI) circuits.Since copper thin film is subj...
Plasma enhanced atomic layer deposition of manganese nitride thin film for Cu diffusion barrier laye
[会议论文] 作者：Zheng Guo,Qun Guo,Zhongwei Liu,Lijun Sang,Qiang Chen,
来源：13th Asia-Pacific Conference on Plasma Science and Technolog 年份：2016
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Investigation of electron cyclotron resonance plasma-assisted atomic layer deposition Al2O3 thin fil
[会议论文] 作者：Lijun Sang,Qiang Chen,Xingcun Li,Lizhen Yang,Zhongwei Liu,
来源：2011年第三届微电子及等离子体技术国际会议 年份：2011
Without extra-heating,Al2O3 thin films were deposited on hydrogen-terminated Si substrate etched in hydrofluoric acid by a home-made electron cyclotron resonance (ECR) plasma-assisted atomic layer dep...
The influences of processing parameters on properties of Alumina films deposited by ECR plasma-assis
[会议论文] 作者：Lijun Sang,Qiang Chen,Lizhen Yang,Zhengduo Wang,Zhongwei Liu,
来源：第一届国际ALD应用大会暨第二届中国ALD学术交流会 年份：2012
Without extra-heating,Al2O3 films were prepared by atomic layer deposition(ALD)process through a home-made ECR setup.The influences of processing parameters on properties of alumina films were investi...
[会议论文] 作者：Lizhen Yang,Zhongwei Liu,Zhengduo Wang,Lijun Sang,Haibao Zhang,Jiushan Cheng,Dongdong Wang,Qiang Chen,
来源：13th Asia-Pacific Conference on Plasma Science and Technolog 年份：2016
A nano-thickness silicon oxide coating is deposited on 1.25 m in width,12 μm in thickness of the plastic web surface by magnetized plasma at ambient temperature.We use hexamethyldisiloxane as precurso...
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