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研究加入10%Si(摩尔分数)对Ti Al Si N涂层的影响。采用阴极电弧蒸镀在WC-Co基体上沉积Ti_(0.5)Al_(0.5)N、Ti_(0.5)Al_(0.4)Si_(0.1)N和Ti_(0.55)Al_(0.35)Si_(0.1)N涂层,通过X射线衍射(XRD)、X射线光电子能谱(XPS)、扫描电镜(SEM)、纳米压痕测量和划痕试验研究涂层的显微组织和力学性能,探讨Si对涂层的性能和结合失效模式的影响机理。结果表明:加入10%Si后,涂层中形成非晶Si_3N_4包覆(Ti,Al,Si)N纳米晶的纳米复合结构。TiAlSiN涂层的硬度和韧性升高,但结合强度下降。与Ti_(0.55)Al_(0.35)Si_(0.1)N涂层相比,Ti_(0.5)Al_(0.4)Si_(0.1)N涂层的硬度较高但韧性较低。TiAlN涂层由于韧性低、界面结合强,因此结合失效模式以楔形剥落为主。Ti AlS iN涂层由于韧性改善、但界面结合变差,因此结合失效模式以屈曲剥落为主。
The effect of adding 10% Si (mole fraction) on the Ti Al Si N coating was investigated. Ti 0.5 Al 0.5 Si 0.1 N and Ti 0.5 0.5 Al 0.35 Si 0.1 N were deposited on WC-Co substrate by cathodic arc evaporation The microstructure and mechanical properties of the coatings were investigated by X-ray diffraction (XRD), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM), nanoindentation and scratch test. The mechanism of performance and combined failure modes. The results show that the nano-composite structure of (Si, Al, Si) N nanocrystals coated with Si 3 N 4 is formed in the coating after adding 10% Si. TiAlSiN coating hardness and toughness increased, but the bond strength decreased. Compared with Ti 0.55 Al 0.35 0.35 Si 0.1 N coating, Ti 0.5 Al 0.4 Si 0.1 N coating has higher hardness and lower toughness. TiAlN coating due to low toughness, strong interface, so combined with the failure mode to wedge-shaped peel-based. Ti AlS iN coatings, due to their improved toughness but poor interfacial bonding, are dominated by buckling and spalling in combination with failure modes.