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本文描述采用泰勒透明硬光刻掩模版和施普莱AZ-1350光致抗蚀剂的高分辨率光刻掩模的制造过程。稍经修改,此过程可与其他光致抗蚀系统同用并能得到同样的良好结果。光刻版的光吸收特性见说明。
This article describes the fabrication of high resolution lithography masks with Taylor clear hard mask and Spray aluminum AZ-1350 photoresist. With minor modifications, this process can be used with other photoresist systems and yield the same good results. The light absorption characteristics of the lithography plate are described.