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本文提出了一种多入射角椭偏术无损测定吸收薄膜ｎ、 ｋ、 ｄ的方法（ＱＷＤ－８４法）。叙述了它的基本原理和数据处理方法，探讨了测定技术中的几个要点，给出了测定流程图，并对玻璃和硅衬底的一些吸收薄膜进行了测定和比较。测定结果表明：该法是一种一次性无损实测吸收薄膜ｎ、ｋ、ｄ值的有效方法，它系统可靠、方便易行，对薄膜参数的测定和成膜工艺的研究有较重要的价值。
This paper presents a non-destructive method for the determination of n, k, d (QWD-84) absorption thin films by multiple angle of incidence ellipsometry. Describes its basic principles and data processing methods, discusses several key points in the determination of the technology, gives the flow chart, and some of the glass and silicon substrates were measured and compared with the absorption film. The results show that this method is an effective and non-destructive method to measure the n, k, d values of the absorbed films. It is reliable and easy to operate. It has important value for the determination of the film parameters and the research of the film-forming process.