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由单层HfO2,SiO2,Y2O3,Al2O3膜求出其折射率和消光系数色散曲线,据此计算出HfO2/SiO2,Y2O3/SiO2,Al2O3/SiO2的193nm多层膜反射膜曲线,并用电子束热蒸发的方法进行镀制。由分光光度计测量样品的透射率和绝对反射率,求出了各种膜层的吸收曲线。结果发现HfO2/SiO2,Al2O3/SiO2反射率实验结果与理论结果吻合得很好,而Y2O3/SiO2的理论曲线偏高。通过模拟Y2O3/SiO2的反射率曲线发现Y2O3的消光系数远大于由单层膜实验得出的结果。这说明Y2O3膜层的吸收特性与薄膜的制备工艺密切相关。
The refractive index and extinction coefficient dispersion curves of HfO2 / SiO2, Y2O3 / SiO2 and Al2O3 / SiO2 were calculated from the single layers of HfO2, SiO2, Y2O3 and Al2O3 films. Evaporation method of plating. The transmittance and absolute reflectance of the sample were measured by a spectrophotometer, and the absorption curves of various films were obtained. The results show that the experimental results of HfO2 / SiO2, Al2O3 / SiO2 reflectance agree well with the theoretical results, while the theoretical curve of Y2O3 / SiO2 is high. The extinction coefficient of Y2O3 was found to be much larger than that obtained from a single-layer film experiment by simulating the reflectance curve of Y2O3 / SiO2. This shows that the absorption characteristics of Y2O3 film is closely related to the preparation of the film.