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利用电弧离子镀方法在基体上制备了TiN薄膜,研究了靶基间距对大颗粒形貌和分布规律的影响。采用扫描电子显微镜(SEM)观察了TiN薄膜的表面形貌,利用Image J科学图像软件对Ti大颗粒的数目和尺寸进行了分析。结果表明:随着靶基间距的增加,薄膜表面的大颗粒数目迅速降低,在靠近弧源最近的15 cm位置处大颗粒数目最多,出现了典型的长条状形貌,同时大颗粒所占的面积比也最大。为了兼顾薄膜的沉积速率和消除大颗粒缺陷的不利影响,最佳的靶基距离为20~30 cm。
TiN thin films were prepared on the substrate by arc ion plating, and the effect of target spacing on the morphology and distribution of large particles was investigated. The surface morphology of TiN thin films was observed by scanning electron microscopy (SEM), and the number and size of large Ti particles were analyzed by Image J scientific image software. The results show that the number of large particles on the surface of the film decreases rapidly with the increase of the distance between the target and the largest number of large particles near the 15 cm near the arc source. The area ratio is also the largest. In order to take into account the film deposition rate and eliminate the adverse effects of large particle defects, the best target base distance of 20 ~ 30 cm.