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日本正在研究一种新技术,为开发大批生产高温超导材料,如金属丝、线圈以及复合形状的薄膜作准备。一个研究小组与 Riken 公司(密封环制造商)合作,采用化学汽相沉积给各种基底涂上氧钇钡铜薄膜。广泛应用于半导体工业的化学汽相沉积使平厚的薄膜被沉积在电路基底的微米尺寸步长和通道内,一次可以覆盖大量基底。据报道世界上有几个半导体厂商试验了一种用于高 T_c 超导体的技术,但是未能发现一种适合的待蒸发的钡复合物。直到现在,物理气相沉积技术,
Japan is studying a new technology that will prepare for the development of mass production of high temperature superconducting materials such as wires, coils, and composite shapes. A team working with Riken, a seal ring manufacturer, applied chemical vapor deposition to a variety of substrates with barium titanate copper films. Chemical vapor deposition, which is widely used in the semiconductor industry, allows flat films to be deposited in micron-sized steps and channels in the circuit substrate to cover a large number of substrates at a time. It is reported that several semiconductor manufacturers around the world have experimented with a technique for high Tc superconductors, but failed to find a suitable barium complex to be evaporated. Until now, physical vapor deposition technology,