论文部分内容阅读
用ＤＭＰ４５０ 型电子束镀膜机，制备了Ｙ２Ｏ３ＺｒＯ２ 膜，并将它用作１．３μｍ 半导体激光器的减反射膜．测试结果表明，镀膜后的半导体激光器其外微分子量效率明显提高，线性化也有改善．对于减反程度很高的管子，出现了超辐射现象．本文对这些现象及有关机理进行了讨论．
DMP 450 electron beam coating machine, prepared Y2O3 ZrO2 film, and it is used as a 1.3μm semiconductor laser antireflection film. The test results show that the external micro-molecular quantum efficiency of the coated semiconductor laser is obviously improved and the linearization is also improved. For a very high degree of anti-tube, there has been super-radiation phenomenon. This article discusses these phenomena and related mechanisms.