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研究了ＴｉＮｉ形状记忆合金薄膜的表面形貌及其影响因素．试验结果证明：该薄膜的 形成过程遵循形核、长大、迷津结构和连续膜４个阶段．镀膜时氩分压、基板温度、基板类型、基 板的表面粗糙度以及膜的成分、镀后热处理等都对薄膜的形貌有重大的影响．
The surface morphology of TiNi shape memory alloy films and its influencing factors were studied. The test results show that the formation of the film follows the four stages of nucleation, growth, labyrinth structure and continuous film. Argon partial pressure during coating, substrate temperature, substrate type, substrate surface roughness and film composition, post-plating heat treatment and so on have a significant impact on the morphology of the film.