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采用同轴原子氧模拟装置进行了空间原子氧效应对温控材料Teflon FEP/A l薄膜的影响研究.在束流密度为1.07×1016atoms/cm2.s的条件下,对材料进行不同剂量辐照,研究了Teflon FEP/A l薄膜的质量损失、表面形貌、表面粗糙度和光学性能的演化规律和表面元素的组成变化.试验结果表明,材料的质量损失与原子氧辐照剂量成正比例关系.随着原子氧辐照剂量的增加,材料的表面形貌由平整变为“地毯状”形貌,表面粗糙度、太阳吸收率和太阳吸收率与热发射率的比值发生明显变化,从而导致材料光学性能发生变化.辐照前后材料表面成份组成变化不大.
The effects of space atomic oxygen on the temperature-controlled Teflon FEP / Al films were investigated by a coaxial atomic oxygen simulator at a beam density of 1.07 × 1016atoms / cm2.s, , The evolution of mass loss, surface morphology, surface roughness and optical properties of Teflon FEP / Al films and the change of the composition of the surface elements were investigated.The experimental results show that the mass loss of the material is directly proportional to the dose of atomic oxygen irradiation . With the increase of atomic oxygen irradiation, the surface morphology of the material changed from flat to “carpet-like” morphology, the surface roughness, solar absorptance and the ratio of solar absorptance to thermal emissivity obviously changed, which led to The optical properties of the material changed. The composition of the surface of the material before and after irradiation changed little.