高频等离子休沉积是高频放电等离子体化学气相沉积的简称,是近二十年来进展异常迅速的固体薄膜制备技术.在半导体工业中,这种技术已成为大规模集成电路干式生产工艺流程中的重要环节.自1973年以来,英国、美国、日本相继利用这种技术制成了氢化非晶硅(a-Si:H)薄膜.如美国能量转 High-frequency plasma deposition is the abbreviation of high-frequency discharge plasma chemical vapor deposition, which is an extremely rapid solid thin film preparation technology that has progressed rapidly in recent twenty years. In the semiconductor industry, this technology has become a large-scale integrated circuit dry production process In 1973. Britain, the United States and Japan have successively made hydrogenated amorphous silicon (a-Si: H) thin films by using this technique since 1973. As the U.S. energy transfer