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本文利用金属有机气相沉积法(MOCVD)生长单一立方相Mg0.57Zn0.43O(记作立方MZO)合金薄膜,以及该合金薄膜在后期热处理过程中质量和热稳定性的关系.通过X射线衍射等测试发现,后期热处理对于立方MZO合金薄膜质量具有较大的影响.其中在500—850C的条件下,合金薄膜的结晶质量和表面形貌随温度的增加得到明显的改善,吸收截止边逐渐蓝移,带隙展宽,但仍保持单一立方结构.当温度达到950C时立方MZO合金薄膜出现混合相.通过对立方MZO合金薄膜制备的MSM型单元器件进行光响应的测试表明,在外加15V的偏压下,器件的响应峰值在260nm附近,紫外/可见抑制比大约为4个数量级,饱和响应度为3.8mA/W,暗电流值为5pA左右.
In this paper, the growth of single cubic phase Mg0.57Zn0.43O (MZO) alloy thin film by metal organic vapor deposition (MOCVD) and the relationship between the quality and thermal stability of the alloy thin film during the post-heat treatment were investigated by X-ray diffraction The results show that the post-heat treatment has a great influence on the quality of the cubic MZO alloy film, in which the crystal quality and the surface morphology of the alloy film are obviously improved with the increase of the temperature under the condition of 500-850C, , The bandgap broadens, but still maintains a single cubic structure.When the temperature reaches 950C, the cubic MZO alloy films appear mixed phase.According to the MZO alloy film prepared on the MSM-type unit device for the photoresponse test showed that the application of a bias voltage of 15V , The response peak of the device is near 260nm, the UV / visible rejection ratio is about 4 orders of magnitude, the saturation responsivity is 3.8mA / W and the dark current is about 5pA.