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SIMOX技术是最具有发展前途的SOI技术之一。在发展薄硅层、深亚微米OMOS/SOI集成电路中,SIMOX技术占有极其重要的地位。本文综述了SIMOX基片的形成、高质量SIMOX基片的制备方法。阐述了薄硅层OMOS/SIMOX器件的工艺特点以及器件的性能特点。本文也就SIMOX技术及GMOS/SIMOX器件的研究现状及发展趋势进行了讨论。
SIMOX technology is one of the most promising SOI technologies. SIMOX technology plays a very important role in the development of thin silicon layers, deep sub-micron OMOS / SOI integrated circuits. This article reviews the formation of SIMOX substrates and the preparation of high quality SIMOX substrates. The technological characteristics of thin silicon layer OMOS / SIMOX device and the performance characteristics of the device are described. This article also discussed the research status and development trend of SIMOX technology and GMOS / SIMOX device.