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针对几种应用于工具镀膜的磁场控制的电弧离子镀弧源,分析了其结构、工作原理以及弧斑运动、放电特性;比较了不同磁场辅助受控弧源的靶结构及磁场位形,并讨论了对弧斑运动、放电及镀膜工艺的影响;对磁场控制的电弧离子镀弧源的发展进行了展望。
The structure, working principle and the movement and discharge characteristics of arc spot were analyzed for several kinds of arc ion plating arc source controlled by magnetic field applied to the tool coating. The target structures and magnetic field configurations of controlled arc sources with different magnetic fields were compared. The effects of arcing motion, discharge and coating process are discussed. The development of arc ion plating arc source controlled by magnetic field is also discussed.