利用自行开发的SPM刻蚀系统在Au Pd合金膜上成功地机械刻划出纳米尺度的孔洞、沟槽和复杂的图形 ,最小线宽达 2 5nm .该系统可以很方便地用来加工所需要的任意纳米图形 ,并且AFM图象表明机械刻划出来的纳米结构非常清晰 ,真实地反映出待刻图形的细节而没有变形 ,这说明该刻蚀系统具较高的可靠性和可控性 .同时 ,实验结果表明我们制得的Au Pd合金膜非常平整并具备优良的机械刻划性能 ,它可以被用作为制备纳米器件的掩膜或直接用于纳米结构的制备 . The self-developed SPM etching system successfully sculpts Au Pd alloy films with nanometer-scale holes, grooves and complex patterns with a minimum line width of 25nm. The system can be conveniently used for processing the required , And the AFM images show that the mechanically delineated nanostructures are very clear and truly reflect the details of the to-be-etched pattern without deformation, indicating that the etching system has high reliability and controllability. At the same time, the experimental results show that the Au Pd alloy film we prepared is very smooth and has excellent mechanical scoring performance. It can be used as a mask for the fabrication of nanodevices or directly for the preparation of nanostructures.