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高功率激光物理国家实验室与日本大阪大学激光工程研究所合作,于1996年10月17日至11月8日在Gekko Ⅻ装置上进行了类Ni-钕X射线激光实验。实验采用四脉冲1.053 μm激光驱动,第一脉冲与第二脉冲间隔为1 ns,其余脉冲间隔为400～600 ps,每个脉冲宽度为100 ps,靶面平均功率密度为5×10~(13) W/cm~2。单块钕弯曲靶长2 cm,曲率半径为2.5 m。采用两路激光双靶对接方式,实验获得了波长为7.9 nm的高强度软X射线激光,用时间分辨的光栅谱仪记录到对应于第四个驱动激光脉冲的软X射线激光信号在双靶对接时,其输出强度比
The National Laboratory for High Power Laser Physics, in collaboration with the Institute of Laser Engineering, Osaka University, Japan, conducted a Ni-neodymium X-ray laser experiment on a Gekko device from October 17 to November 8, 1996. The experiment was carried out by using a four-pulse 1.053 μm laser. The interval between the first pulse and the second pulse was 1 ns. The remaining pulse intervals were 400-600 ps. Each pulse width was 100 ps. The average power density of the target surface was 5 × 10-13 ) W / cm ~ 2. The monolithic neodymium bend has a target length of 2 cm and a radius of curvature of 2.5 m. Two-way laser dual-target docking method was used to obtain a high-intensity soft X-ray laser with a wavelength of 7.9 nm. A time-resolved grating spectrometer was used to record the soft X-ray laser signals corresponding to the fourth driving laser pulse. When docking, the output intensity ratio