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对各种铝合金(2017,7075,6082,5754,5083,360.0)进行离子渗氮,研究化学成分及工艺参数对形成氮化铝层的关系。通过对简单和较复杂形状试样的研究来了解渗氮膜的均匀性。研究了AlN层的各种特能后发现,对各种铝合金不经溅射进行渗氮处理都可以形成AlN膜。氮化物层的特点是高硬度,结合力强,高的耐磨性和耐蚀性。氮化物层的生长速度由于表面覆盖不同的氧化层主要取决于材料的化学成分。由于试样形状影响表面附近的等离子的特性,所以几何形状复杂的零件很难生成均匀的渗氮层。
Various types of aluminum alloy (2017,7075,6082,5754,5083,360.0) ion nitriding, chemical composition and process parameters on the formation of aluminum nitride layer relationship. Understand the uniformity of nitriding films by studying simple and complex shaped specimens. After studying various special features of the AlN layer, it was found that AlN films can be formed on various aluminum alloys without nitriding by sputtering. Nitride layer is characterized by high hardness, strong binding, high wear resistance and corrosion resistance. The growth rate of the nitride layer due to the surface coverage of different oxide layer depends mainly on the chemical composition of the material. Because the shape of the sample affects the properties of the plasma near the surface, it is difficult to produce a uniform nitrided layer with a geometrically complex part.