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用微波等离子体化学气相沉积 ( MPCVD)法在氧化铝陶瓷基片上沉积了金刚石薄膜。实验表明 ,对基片进行适当的预处理 ,包括用金刚石研磨膏仔细研磨和沉积前原位沉积一层无定形碳层 ,可显著提高成核密度 ;对硅衬底和氧化铝基片上金刚石膜的成核过程进行了对比分析 ,并提出了提高氧化铝基片上沉积金刚石的成核密度的措施。
Diamond films were deposited on alumina ceramic substrates by microwave plasma chemical vapor deposition (MPCVD). Experiments show that proper pretreatment of the substrate, including grinding with a diamond paste and depositing an amorphous carbon layer in situ before deposition, can significantly improve the nucleation density; on the silicon substrate and the alumina film on the diamond film The comparison of the nucleation process and the measure to improve the nucleation density of the diamond deposited on the alumina substrate was made.