利用离子束增强沉积（ＩＢＥＤ）技术制备了ＣｒＮｘ薄膜。对不同能量氮离子轰击所制备的薄膜进行了Ｘ射线衍射、Ｘ射线光电子能谱分析、膜层断裂韧性以及摩擦学性能研究。试验结果表明，在相同试验条件下，氮离子轰击能量影响ＣｒＮｘ薄膜的相组成及取向，低能氮离子轰击所制薄膜具有较高的ＫＩＣ数值，且表现出更优异的摩擦学性能。 CrNx thin films were prepared by ion beam enhanced deposition (IBED) technique. X-ray diffraction, X-ray photoelectron spectroscopy, film fracture toughness and tribological properties of thin films prepared by bombardment of different energy nitrogen ions were studied. The experimental results show that under the same experimental conditions, the nitrogen ion bombardment energy affects the phase composition and orientation of the CrNx thin films. The films prepared by the low-energy nitrogen ion bombardment have higher KIC values ​​and exhibit more excellent tribological properties.