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本文利用浸渍涂敷法在硅基多孔氧化铝模版介质(孔径20 nm~100 nm)上制备了Pb(Zr0.53Ti0.47)O3(PZT)铁电纳米结构,并利用扫描透射电子显微镜(STEM)观察了其表面形貌和剖面微结构。TEM像和X-射线能谱分析结果表明在多孔氧化铝模版孔道内形成了PZT纳米结构,其横向尺寸可通过改变氧化铝模版的孔径来调节。采用浸渍涂敷法可使PZT溶液贯穿整个氧化铝纳米孔道,在其内壁形成PZT涂层,厚度为4 nm~15 nm。氧化铝纳米孔道内的黑色TEM衬度线证实了PZT涂层的存在,其存在方式为连续介质型或离散的晶粒形状。平面STEM像显示PZT纳米结构具有椭球状形貌,这可能是由氧化铝纳米孔道的局部扭曲或PZT溶液在退火过程中的收缩引起的。在硅基多孔氧化铝模版介质上采用浸渍涂敷法制备的PZT有序纳米结构,在将来三维结构的非挥发性铁电存储器方面具有十分诱人的应用前景。
In this paper, Pb (Zr0.53Ti0.47) O3 (PZT) ferroelectric nanostructures were prepared by dip-coating on Si-based porous alumina template media (20 nm ~ 100 nm in pore size). Scanning transmission electron microscopy ) Observed its surface morphology and cross-sectional microstructure. TEM image and X-ray energy spectrum analysis results show that the PZT nanostructures are formed in the pores of the porous alumina template. The lateral size can be adjusted by changing the pore size of the alumina template. The PZT solution can penetrate through the alumina nanopore with dip coating method and form PZT coating on the inner wall of the PZT coating with a thickness of 4 nm to 15 nm. The black TEM contrast line in the alumina nanopore confirms the presence of the PZT coating in the form of a continuous dielectric or discrete grain shape. The planar STEM images show that the PZT nanostructures have ellipsoidal morphology, which may be caused by local distortions of the alumina nanopore or contraction of the PZT solution during annealing. PZT-ordered nanostructures prepared by dip coating on Si-based porous alumina template media have very attractive potential applications in the future three-dimensional structure of nonvolatile ferroelectric memory.