尽管 1年前 157ｎｍ光刻还被认为是不实际的甚至不可能实现的生产技术 ,目前产业界仍在试图考虑最佳的材料和工艺使 1 5 7ｎｍ光刻技术成为现实。ＩＭＥＣ公司最近宣布了一个新的 1 5 7ｎｍ光刻的开发计划 ,目的在于到 2 0 0 3年实现可靠的 1 5 7ｎｍ光刻工艺。鉴于光学材料在 Although 157 nm lithography was considered a pragmatic or even impossible production technology a year ago, the industry is still trying to consider the best materials and processes to make 157 nm lithography a reality. IMEC recently announced a development plan for a new 157 nm lithography with the goal of achieving a reliable 175 nm lithography process by 2003. Given the optical material in