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由电子工业部长沙半导体工艺设备研究所研制的我国第一台能量为700keV的高能离子注入机已于1987年底在长沙胜利诞生。现代电子工业的发展以半导体(微电子)技术为基础,半导体技术的发展又以半导体工艺设备为支撑条件。中国科学院半导体研究所为了开发我国半导体技术需要高能量的离子注入机进行试验研究工作,从国外引进这类先进设备,不但价格昂贵,而且维修、配件供应十分困难。前几年,一些单位不惜重金购买洋设备,而半导体所经过调查
The first high-energy ion implanter with energy of 700keV developed by Changsha Institute of Semiconductor Process Equipment of Ministry of Electronics Industry was born in Changsha at the end of 1987. The development of modern electronics industry to semiconductor (microelectronics) technology as the foundation, the development of semiconductor technology and semiconductor technology equipment to support the conditions. Institute of Semiconductors Chinese Academy of Sciences in order to develop our semiconductor technology requires high-energy ion implanter for experimental research, the introduction of such advanced equipment from abroad, not only expensive, and maintenance, spare parts supply is very difficult. A few years ago, some units spared no expense to buy foreign equipment, and the semiconductor after investigation