E-H mode transition and hysteresis in argon and argon-nitrogen mixture radio-frequency inductively c

来源 :2011年第三届微电子及等离子体技术国际会议 | 被引量 : 0次 | 上传用户：wenqin2000

【摘要】

：

Inductively coupled plasma (ICP) has been widely used in semiconductor industry,due to its perfect characteristics of reduced ion damage,independently controllable ion energy and high density plasmas.

【作者】

：

Fei Gao You-Nian Wang

【机构】

：

School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024,Peop

【出处】

：

2011年第三届微电子及等离子体技术国际会议

【发表日期】

：

2011年9期

【关键词】

：

Inductively Coupled Plasmas E-H Mode Transition Hysteresis

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E-H mode transition and hysteresis in argon and argon-nitrogen mixture radio-frequency inductively c

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