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环境温度气体通过进气管进入高温扩散炉管后迅速膨胀,气体流量和流速均数倍增加;气体射流在炉尾形成的紊流区延伸到工艺恒温区范围,导致靠近炉尾恒温区的气体流动不稳定。通过放置挡板或挡片的方式可以减轻炉尾紊流区对恒温区Si片工艺的影响。根据扩散炉管内气体的流动状态和气体动力学有关参数和计算方法,推导出计算气体流量的数学模型公式,只需利用扩散炉管的基本参数就可以计算出需要通入炉管的环境温度气体流量,减少凭经验判定气体流量参数的盲目性,减少不必要的气体材料消耗。
Ambient temperature The gas expands rapidly through the intake pipe into the high temperature diffusion furnace tube, which increases the gas flow rate and the flow rate several times. The turbulence area formed by the gas jet in the furnace tail extends to the process temperature range, resulting in the gas flow near the furnace tail temperature zone Unstable By placing the baffle or the baffle can reduce the influence of the furnace tail turbulence zone on the Si wafer process. According to the flowing state of the gas in the diffusion tube and the related parameters and calculation methods of the gas dynamics, a mathematical model formula for calculating the gas flow rate is derived. Only the basic parameters of the diffusion tube can be used to calculate the ambient temperature gas that needs to be introduced into the tube Flow, reducing blindness of gas flow parameters empirically determined, reducing unnecessary gas material consumption.