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利用SiO升华的反应蒸发技术制备了SiyOx薄膜，并将它成功地应用于半硬冷光膜。讨论了真空度、蒸镀速率及后期处理工艺对SiyOx薄膜折射率的影响。
SiyOx thin films were prepared by reaction evaporation technique of SiO sublimation and successfully applied to semi-hard cold-light films. The effects of vacuum degree, deposition rate and post-treatment process on the refractive index of SiyOx films are discussed.