根据光学原理,可分辨的线宽与(λg)~(1/2)成正比。式中λ为光学系统的波长,g 为光学掩模与片子之间的间隙。假如我们使光刻机光学系统的波长缩短一半,掩模与片子的间隙保持不变,则所能分辨的线宽变成1/2~(1/2)倍,如果线宽保持不变,则掩模与片子之间的分离间隙 According to the optical principle, the resolvable linewidth is proportional to (λg) ~ (1/2). Where λ is the wavelength of the optical system and g is the gap between the optical mask and the film. If we shorten the wavelength of the optical system of the lithography machine by half and the gap between the mask and the film remains the same, the line width that can be resolved becomes 1/2 ~ (1/2) times. If the line width remains the same, The separation gap between the mask and the film