57nm深紫外激光因其波长短且具有较高的光子能量,被视为较理想的微刻蚀工具之一。介绍了157nm深紫外激光的刻蚀机理,并利用先进的157nm激光微加工设备,进行了一系列微刻蚀实验。研究了激光工艺参数对石英玻璃的刻蚀效率和表面粗糙度的影响,进行了多种三维微结构的加工试验,证实了157nm激光微刻蚀工艺在制备MOEMS器件方面的实用性。 Because of its short wavelength and high photon energy, 57nm deep UV laser is considered as one of the ideal micro-etching tools. The etching mechanism of 157nm deep UV laser is introduced and a series of micro-etching experiments are carried out by using advanced 157nm laser micro processing equipment. The effects of laser process parameters on the etching efficiency and surface roughness of quartz glass were studied. Various three-dimensional microstructures were processed to verify the practicability of 157nm laser micro-etching in the preparation of MOEMS devices.