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采用金属有机化学气相沉积(MOCVD)技术在蓝宝石衬底上制备出晶体质量较好的透明导电的ZnO/Au/ZnO(ZAZ)多层膜,其中,Au夹层是通过射频磁控溅射的方法获得。通过对Au夹层进行不同温度的退火处理,研究了Au层退火温度对ZAZ多层膜的结构特性、电学性能和光学特性的影响。利用原子力显微镜(AFM)、扫描电子显微镜(SEM)、X射线衍射(XRD)仪、霍尔效应测试和透射谱分析等测试手段对ZAZ多层膜的性质进行了分析。测试结果表明,在200℃下对Au夹层进行快速退火处理,多层膜的结构、电学和光学性质达到最优,表面等离子体效应也更明显。其中,XRD(002)衍射峰的半高宽为0.14°,电阻率为2.7×10-3Ω.cm,载流子浓度为1.07×1020cm-3,可见光区平均透过率为75.3%。
Transparent conductive ZnO / Au / ZnO (ZAZ) multilayered films with better crystal quality were prepared by metalorganic chemical vapor deposition (MOCVD) technique. Among them, Au interlayers were fabricated by RF magnetron sputtering obtain. The effects of the annealing temperature of Au layer on the structural, electrical and optical properties of the ZAZ multilayers were investigated by annealing the Au interlayers at different temperatures. The properties of ZAZ multilayers were analyzed by atomic force microscopy (AFM), scanning electron microscopy (SEM), X-ray diffraction (XRD), Hall effect and transmission spectrum analysis. The results show that the structure, electrical and optical properties of the multilayer films are optimized and the surface plasmon effect is more obvious at 200 ℃. The XRD (002) diffraction peak has a FWHM of 0.14 °, a resistivity of 2.7 × 10 -3 Ω · cm, a carrier concentration of 1.07 × 10 20 cm -3 and an average transmittance of 75.3% in the visible region.