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利用自行研制的过滤式阴极电弧沉积装置，在硅片和高速钢基体材料上获得了类金刚石薄膜，分别采用扫描电镜、原子力显微镜、喇曼光谱以及磨损实验等手段对薄膜进行了分析研究。结果表明，所获得的类金刚石薄膜为非晶态，ｓｐ３含量最高达７０％；基体材料对成膜质量影响较大，在硅片上薄膜的摩擦系数可达０．０８；同时偏压的变化会引起喇曼谱线中Ｄ峰和Ｇ峰位置向低频移动，半高宽σＧ增大、σＤ减小。
DLC films were obtained on a silicon substrate and a high speed steel substrate by a filtered cathode arc deposition device developed by ourselves. The films were analyzed by scanning electron microscopy, atomic force microscopy, Raman spectroscopy and wear tests, respectively. The results show that the obtained diamond-like carbon film is amorphous and the content of sp3 is up to 70%. The matrix material has a great influence on the film quality. The friction coefficient of the film on the silicon wafer can reach 0.08. Meanwhile, It will cause the position of D peak and G peak in Raman spectrum to move to low frequency. The full width at half maximum (σG) and σD decrease.