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In this work we investigate the dispersion of CuCl on γ-Al_2O_3 surface and the adsorptionof ethylene on CuCl/γ-Al_2O_3. X-ray diffraction experiments and u.v. diffuse reflectancespectra have shown that CuCl is highly dispersed on γ-Al_2O_3 surface, very likely as a mono-layer. The maximun amount of dispersion of CuCl on γ-Al_2O_3 surface determined by X-ray quantitative phase analysis is 0.095 g CuCl/100 M~2 on γ-Al_2O_3. The adsorption ofethylene on dispersed CuCl can be conveniently studied by the temperature programed de-sorption (TPD) method and shown to be achieved readily at ambient temperature and nor-mal pressure. The ability of adsorption for ethylene on CuCl/γ-Al_2O_3 is greater by threeorders of magnitude than that on undispersed CuCl particles of comparable size. The max-imum molecular ratio of ethylene adsorbed to dispersed CuCl is 0.19 C_2H_4/Cu~+. The cu-prous ions of dispersed CuCl can form surface complex with molecules such as C_2H_4 or C_3H_6so long as the stereochemical conditions are satisfied. These results may provide additionalscientific basis for separating unsaturated molecules from saturated ones by CuCl/γ-Al_2O_3.
In this work we investigate the dispersion of CuCl on γ-Al 2 O 3 surface and the adsorption of ethylene on CuCl / γ-Al 2 O 3. X-ray diffraction experiments and uv diffuse reflectances have shown that CuCl is highly dispersed on γ-Al 2 O 3 surface, very likely as a mono-layer. The maximun amount of dispersion of CuCl on γ-Al 2 O 3 surface determined by X-ray quantitative phase analysis is 0.095 g CuCl / 100 M ~ 2 on γ-Al 2 O 3. The adsorption ofethylene on dispersed CuCl can be conveniently studied by the temperature programed de-sorption (TPD) method and shown as be adapted readily at ambient temperature and nor-mal pressure. The ability of adsorption for ethylene on CuCl / γ-Al 2 O 3 is greater by three orders of magnitude than that on undispersed CuCl particles of The max-imum molecular ratio of ethylene adsorbed to dispersed CuCl is 0.19C_2H_4 / Cu ~ +. The cu-proutes of dispersed CuCl can form surface complex with molecules such as C_2H_4 or C_3H_6so long as the ste reochemical conditions are satisfied. These results may provide additionals scientific basis for separating unsaturated molecules from HSLA by CuCl / γ-Al 2 O 3.