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目前小技术节点的光学邻近效应校正(OPC)过分依赖光刻机与光刻工艺的属性,量产时难以在不同型号光刻机间转移,而国内芯片制造厂光刻机种类繁杂,不可避免地需要解决工艺转移的问题。针对上述问题,以不同光刻机间的光学邻近效应匹配为研究对象,阐述了匹配的原理及流程,提出了一种利用常用的OPC建模工具实现离线匹配的方法,模拟分析了该方法对成像误差的补偿效果,揭示了不同性质的误差对成像性能的影响规律,验证了该方法的正确性,为不同光刻机间的工艺转移提供了新的思路。
At present, the optical proximity effect correction (OPC) of small technology nodes is overly dependent on the properties of the lithography machine and the lithography process, and it is difficult to transfer between different types of lithography machines in mass production. However, the types of lithography machines in the domestic chip factories are numerous and inevitable Need to solve the problem of process transfer. In view of the above problems, taking the optical proximity effect matching among different lithography machines as the research object, the principle and process of matching are expounded. A method to realize offline matching by using common OPC modeling tools is proposed. The compensation effect of imaging error reveals the influence law of the error of different properties on the imaging performance, verifies the correctness of the method and provides a new idea for the process transfer between different lithography machines.