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高压氧化系统正被人们用于高密度集成电路的生产中,以便在低温下获得快速氧化;商品化的系统可提供高达25个大气压的压力,这对湿氧氧化来说是很理想的,目前这方面的研究工作包括对一种样机系统的研究,这种系统目前人们正在建造,以便研究在高达700大气压下干氧生长氧化物的可能性。
High-pressure oxidation systems are being used in the manufacture of high-density integrated circuits for rapid oxidation at low temperatures; commercial systems provide pressures up to 25 atmospheres which are ideal for wet oxygen oxidation and are currently Research efforts in this area have included the study of a prototype system currently under construction for the study of the potential for dry oxygen growth at up to 700 atmospheres.