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在载玻片或ITO涂覆的玻璃上采用化学热解法沉积CdS固体薄膜 ,沉积温度在 35 0～ 5 4 0℃之间 .部分制备的CdS薄膜进行 2 0 0～ 6 0 0℃的退火热处理 .由SEM ,AFM和XRD分析测量退火热处理前后的CdS薄膜的微观结构 .结果表明 ,沉积温度低于 5 4 0℃以下制备的CdS薄膜具有类六方结构相 ,当高于 5 4 0℃沉积的CdS薄膜则显示纤锌矿相 .在 4 0 0℃化学热解沉积的CdS薄膜经高于 5 0 0℃的后热处理也可获得纤锌矿相 .CdS薄膜的晶粒尺寸依赖于沉积温度及不同基体的情况也在本文中进行了讨论
CdS solid films were deposited on glass slides or ITO-coated glass by chemical pyrolysis at a deposition temperature of 35 0-540 ° C. Partially prepared CdS films were annealed at 200-600 ° C. The microstructure of CdS thin films before and after annealing was measured by SEM, AFM and XRD.The results show that the CdS thin films deposited at temperatures below 540 ℃ have the hexagonal structure, Of the CdS film shows wurtzite phase.When the CdS film is deposited by chemical pyrolysis at 400 ℃, the wurtzite phase can also be obtained by post-heat treatment at higher than 500 ℃ .The grain size of the CdS film depends on the deposition temperature And the different matrix of the situation is also discussed in this article