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应用组合技术,通过离子束溅射法制备了Zn-Al-Ti合金薄膜材料芯片(其中wAl∶wZn=55%∶45%(w,质量分数)),表征了热处理后薄膜的耐腐蚀性能,研究了Ti掺杂量对薄膜耐腐蚀性能的影响.在Ar+5%(φ,体积分数)H2混合气氛中,经200℃扩散1h,再经370℃热处理2h后可以得到高质量的合金薄膜.通过X射线衍射仪(XRD)和扫描电子显微镜(SEM)分别对热处理后的典型样品进行相结构和形貌表征.使用电化学方法测试样品的耐腐蚀性能.结果表明,Ti适量掺杂样品的腐蚀速率明显下降,其中Ti掺杂量为6.0%(w)的Zn-Al-Ti合金薄膜(94.0%(w)Zn-Al,其中wAl∶wZn=55%∶45%)具有最优异的耐腐蚀性能,其原因在于,Ti适量掺入后晶粒明显细化,表面更为致密,且钝化作用增强.
Zn-Al-Ti alloy thin film (wAl:wZn = 55%: 45% (w, mass fraction)) was prepared by ion beam sputtering. The corrosion resistance of the film after heat treatment was characterized, The effect of Ti doping on the corrosion resistance of the films was investigated.The high-quality alloy thin films were obtained by diffusion at 200 ℃ for 1h and then heat treatment at 370 ℃ for 2h in Ar + 5% (φ, volume fraction) The phase structure and morphology of the samples after heat treatment were characterized by X-ray diffraction (XRD) and scanning electron microscopy (SEM) respectively.The corrosion resistance of the samples was tested by electrochemical method.The results showed that the appropriate amount of Ti doped samples (94.0% (w) Zn-Al, where wAl: wZn = 55%: 45%) with a Ti doping amount of 6.0% (w) has the most excellent corrosion rate Corrosion resistance, the reason is that, after appropriate amount of Ti doping significantly refined grains, the surface is more dense, and passivation enhanced.