论文部分内容阅读
近几年来国内开展了电子束曝光技术的研究工作,国内各兄弟单位对于铬掩模在电子束曝光制版中的应用做了大量工作,取得良好成绩。本文对于Fe_2O_3彩色掩模亦能在电子束曝光技术上得到应用提供实验依据,同时对于使用中存在的问题进行初步分析。在经过清洁处理的彩色氧化铁掩模上进行甩胶等一系列工艺流程所得胶厚为1500埃左右,通过束流为1.6×10~(-9)安的电子束曝光,刻蚀后获得良好的版面,其质量和图形清晰度可与铬版相比。
In recent years, the domestic research on electron beam lithography has been carried out. Various domestic units have done a great deal of work on the application of chromium masks in electron beam lithography, and achieved good results. This paper also provides an experimental basis for the application of the Fe_2O_3 color mask in the electron beam exposure technology, and carries out a preliminary analysis of the problems in use. After cleaning the color iron oxide mask on a series of processes such as plastic rejection plastic obtained about 1500 angstroms thick, beam beam through 1.6 × 10 ~ (-9) Ann electron beam exposure, etching good The layout, its quality and graphical clarity with chrome version can be compared.