难熔金属在微电子工业中的应用将与日俱增。研究者发现痕量杂质以各种途径影响着难熔金属的性能。在未来的微电子器件中的潜在应用,在很大程度上取决于难熔粉末是否达到5N 及6N 的纯度水平(即99.999及99.9999%)。现在,有些厂商已能够生产这种高纯度的Mo、Nb、Ta、W 金属粉末与 The application of refractory metals in the microelectronics industry will increase day by day. The researchers found trace impurities affect the performance of refractory metals in a variety of ways. The potential application in future microelectronic devices depends largely on whether the refractory powders reach purity levels of 5N and 6N (ie 99.999 and 99.9999%). Now, some manufacturers have been able to produce this high purity Mo, Nb, Ta, W metal powder and