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本文描述一个袖珍端引出溅射PIG离子源。它用SmCo永久磁钢来产生源的约束场。该源既可以产生气体离子,也可以通过阴极溅射,产生相应金属离子。用该源通常可获得Ar~+500—680μA,Ar~(2+)～150μA;当用BF_3做放电气体时,可得B_(11)~+100—130μA,放电功率约为30W。当用Ar做辅助气体时,在30—50W的弧功率下,可得锆、铁、铝等金属离子70多μA;钽离子50—60μA;钛、钼等金属离子30多μA。两个电荷态的金属离子通常约为一个电荷态金属离子的1/2—1/5。
This article describes a pocket-side lead-out sputter PIG ion source. It uses SmCo permanent magnets to generate the source confinement field. The source can generate both gas ions, can also be generated by sputtering cathode, the corresponding metal ions. Ar ~ + 500-680μA and Ar ~ (2+) ~ 150μA can be obtained by this source. When BF_3 is used as the discharge gas, B_ (11) ~ + 100-130μA can be obtained and the discharge power is about 30W. When Ar is used as an auxiliary gas, more than 70 μA of zirconium, iron, aluminum and other metal ions are obtained at an arc power of 30-50W; tantalum ions are 50-60 μA; more than 30 μA of titanium, molybdenum and other metal ions are obtained. The two charged metal ions are typically about 1 / 2-1 / 5 of one charged metal ion.