法国凯恩大学的研究人员发现了一种把超导薄膜涂复到硅上的方法。以前进行的在硅上涂复超导薄膜的试验都没有取得成功,其原因是薄膜与基质间的相互扩散引起了一系列问题。凯恩大学的研究人员发现,采用金属氮化物作缓冲层可以消除扩散问题。他们的研究结果表明,用活性溅射法可以在硅上涂一层氮化铝、氮化硅或氮化镓扩散阻挡层,然后再通过 Researchers at Kane University in France have found a way to apply superconducting thin films to silicon. Previous attempts to coat a superconducting thin film on silicon have not succeeded because of the interdiffusion between the thin film and the matrix causing a series of problems. Researchers at Kane University have found that the use of metal nitride as a buffer layer can eliminate the problem of diffusion. Their results show that reactive sputtering can be applied to silicon with a layer of aluminum nitride, silicon nitride or gallium nitride diffusion barrier and then passed