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采用阴极电弧沉积方法，制备了与靶材成分基本相同的多元合金Inconel625膜层[1]。用XRD，SEM，TEM研究了不同入射角下所获膜层中的织构分布及其成因。
Cathode arc deposition method was used to prepare the multi-alloy Inconel625 film with the same composition as the target [1]. The texture distribution and its genesis of the obtained films at different incident angles were investigated by XRD, SEM and TEM.