本文应用磁控溅射技术(MS)和混合物理化学气相沉积法(HPCVD)在单晶Al_2O_3基底上制备MgB_2/Ta多层膜.通过扫描电子显微镜(SEM)、原子力显微镜(AFM)、X射线衍射(XRD)和标准四线法对MgB_2/Ta试样的表面形貌、晶体结构、超导特性及断面结构进行了测量研究.结果表明MgB_2/Ta多层膜结构清晰,超导薄膜显示出良好的超导特性. In this paper, MgB 2 / Ta multilayers were prepared on single crystal Al 2 O 3 substrates by magnetron sputtering (MS) and hybrid chemical vapor deposition (HPCVD). The microstructures of the films were characterized by scanning electron microscopy (SEM), atomic force microscopy (AFM), X-ray diffraction (XRD) and standard four-wire method, the surface morphology, crystal structure, superconducting properties and cross-sectional structure of the MgB_2 / Ta samples were measured.The results show that the MgB_2 / Ta multilayer films have a clear structure and the superconducting films show good Superconducting characteristics.